Experimental Physics IV

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  8. Organic molecular beam deposition (OMBD)

Organic molecular beam deposition (OMBD) with in-situ Kelvin probe

Several high vacuum chambers for organic molecular beam deposition (OMBD) are available in the Organic Semiconductors group. With these systems the deposition of organic thin films and organic blends with controlled mixing ratio of two (or more) organic components is possible, as is hybrid doping of organic and inorganic compounds. Structured deposition with inline change of shadow masks allows for the fabrication of fully functional, multi-layer organic light emitting diodes (OLEDs), organic photovoltaics (OPVs) and organic field effect transistors (OFETs). Two of our deposition chambers additionally allow the evaporation of metals and inorganic oxides to create electrode layers without vacuum breach and, thus, to limit potential contamination.

 

In one OMBD chamber, substrate heating to more than 100 °C and cooling with liquid nitrogen is implemented to perform dedicated studies on organic thin film growth. In addition, this system has a vibrating Kelvin probe installed in a separate antechamber so that in-situ Kelvin probe measurements of the surface potential of organic films are possible without breaking the high-vacuum conditions.

 

Fig. 1: OMBD chamber for organic and metal evaporation with a look inside during thermal evaporation of metal contacts below a rotating sample/mask stage.
Fig. 2: Exemplary Kelvin probe measurement of an organic film that shows spontaneous orientation polarization. The slope of the measured contact potential difference (CPD) vs. the film thickness yields the so-called giant surface potential (GSP).

Contact person: Albin Cakaj

 

 

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